Name: 반도체 에피 성장용 실리콘 카바이드 CVD 코팅 오븐
Uploaded: 2026-02-11CST00:06:47-06:00
Duration: 33 s
Description: Discover the HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace, designed for high-performance semiconductor epi growth. Featuring multiple temperature control zones, this furnace ensures uniform coating and rapid deposition rates up to 50 microns per hour. Ideal for carbon-based and ceramic-based materials, it’s engineered for efficiency and precision in semiconductor manufacturing.

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반도체 에피 성장용 실리콘 카바이드 CVD 코팅 오븐

다른 비디오

November 05, 2024

Keyword: CVD 코팅기기

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태그:

#통합된 CVD 코팅기기 #마모 저항자 CVD 코팅기기 #CNC 초경공구 CVD 코팅 설비

Video Description:

Discover the HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace, designed for high-performance semiconductor epi growth. Featuring multiple temperature control zones, this furnace ensures uniform coating and rapid deposition rates up to 50 microns per hour. Ideal for carbon-based and ceramic-based materials, it’s engineered for efficiency and precision in semiconductor manufacturing.

6MPA 5518 진공 가스 압력 시너싱 오븐

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